Experimental methods
We are currently running 12 UHV (Ultra-High Vacuum) machines, a femtosecond laser system and equipment for electrochemical investigations. The UHV chambers are equipped with basic preparation and characterization tools (e.g. low energy electron diffraction (LEED), Auger electron spectroscopy, X-ray photoelectron spectroscopy, mass spectrometer (MS), sputtering (cleaning) and heating devices as well as physical deposition tools such as electron beam evaporators and thermal evaporators).
The principal analysis methods applied in our group are:
- UHV-STM (Scanning Tunneling Microscopy; LT, VT, RT)
- XPS/UPS (X-ray and UV Photoemission Spectroscopy)
- AR-UPS (Angle Resolved UV Photoemission Spectroscopy)
- Momentum Microscopy (Photoemission Tomography)
- HREELS (High Resolution Electron Energy Loss Spectroscopy)
- IRRAS (IR Reflection Absorption Spectroscopy)
- vSFG (Vibrational Sum Frequency Generation Spectroscopy)
- CV (Cyclic Voltammetry)
- EC-STM (Electrochemical Scanning Tunneling Microscopy)
- TDS (Thermal Desorption Spectroscopy)
